Ammonia (NH₃), Hydrogen Fluoride (HF), and Hydrogen Chloride (HCl) are gases commonly present in trace amounts within the Semi FAB environment. Those trace amounts can adversely impact the product quality and diminish yields; they also represent an occupational health hazard. Our high-performance FOUP-borne IoT analyzers will continuously detect & quantify the Airborne Molecular Contamination (AMC) levels of the a/m gases in real-time, while on-the-move in the OHT to maximize the wafer yield & boost the FAB QA/QC.